customized sputtering targets

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

... 2 Grade 5 Sputtering Target Titanium Target Silver Target Sputtering to Coating Sputtering is a widely used deposition technique for creating thin films and coatings on various substrates. In this process, material from a sputtering target (usually in ...

Model Number:Tungsten Sputtering Target

..., metallurgical machinery, smelting equipment, petroleum, etc PARAMETER OD(mm) ID(mm) Length(mm) Custom Made 140-300 120-280 100-3300 Model Number W1 Shape customized Chemical Composition 99.95% W Feature (1) Smooth surface without pore,sporesch and o

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

Sputtering Target Silver Sputtering Target Titanium Disc to High Purity Sputtering in Medical Applications In the realm of Physical Vapor Deposition (PVD) processes, titanium sputtering targets are critical in the production of thin films used in various ...

Brand Name:JINXING

Model Number:Chromium Sputtering Target

Place of Origin:China

Chromium Sputtering Target Chromium sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/...

Brand Name:JINXING

Model Number:Copper Sputtering Target

Place of Origin:China

Copper Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999% For ...

Brand Name:JINXING

Model Number:Copper Rotatable Sputtering Target

Place of Origin:China

Copper Rotatable Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999...

Brand Name:JINXING

Model Number:Copper Plate Sputtering Target

Place of Origin:China

Copper Plate Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999% For ...

Brand Name:JINXING

Model Number:Molybdenum Sputtering Target

Place of Origin:China

..., High-density, high temperature oxidation resistance, long service life, resistance to corrosion. The melting point of coated molybdenum sputtering target is

Brand Name:JINXING

Model Number:Titanium Sputtering Target

Place of Origin:China

Ti Sputtering Targets Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating Ti Sputtering Targets Information: It has a melting point of 1,660°C, a density of 4.5 g/cc, and a vapor pressure of 10-4 Torr at 1,453°C. It is a sturdy material whi...

Categories:Sputtering Target

Country/Region:china

...sputtering target is a high-purity advanced functional material widely used in ferroelectric, piezoelectric, optical coating, and special semiconductor fields. The product is made from high-purity scandium metal through precision processing, featuring excellent film uniformity, structural density, and sputtering stability. It is suitable for various physical vapor deposition processes, such as magnetron sputtering...

Brand Name:LHTi

Model Number:LH-Target

Place of Origin:Baoji, China

Sputtering Target Metal Target and Titanium Target Cylinders Customized for the Medical Industry In the medical industry, the demand for high-quality materials that ensure safety, effectiveness, and durability is paramount. Among these materials, sputtering targets—particularly metal and titanium targets—have gained significant importance due to their unique properties and versatility. These targets...

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

...Sputtering Target Titanium Target Silver Titanium Disc Target Sputtering to Medical Applications In medical applications, high-performance materials are required to meet strict demands for biocompatibility, corrosion resistance, and mechanical properties. Titanium and titanium alloys (such as Grade 2, Grade 5, and Grade 7), when combined with aluminum, form alloys that are widely used in sputtering targets...

Brand Name:LHTI

Model Number:LH-10

Place of Origin:China

...sputtering target for Chemcial industrial Product name: Titanium Sputtering Target Materail: Pure Titanium Gr2 or titanium alloy Gr5 , Ti-Al , Ti-Cr, Ti-Zr etc. Other material: Chrome, Zirconium , Copper , tungsten etc. Shape: Round Dimensions: 60/65/70/80/85/90/95/100(D)×20/30/32/35/40/42/45/50(T) ,can be customized Application: Coating industry, sputtering...

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...

Brand Name:LHTi

Model Number:LH-Target

Place of Origin:Baoji, China

... material for various medical applications. Among the different grades of titanium, Grade 5 (Ti-6Al-4V) and Grade 7 (Ti-0.15Pd) titanium sputtering targets are

Brand Name:LHTi

Model Number:Titanium Disk

Place of Origin:Baoji, Shaanxi, China

... turned to advanced materials to improve the performance and longevity of medical devices. Among these, titanium sputtering targets have become an essential element in creating high-quality thin films used in a variety of applications, including implants,

Brand Name:Changsheng

Model Number:ASTM

Place of Origin:China

Description Titanium Sputtering Targets are high-purity titanium materials used in physical vapor deposition (PVD) and magnetron sputtering processes. Titanium is a lustrous, silvery-white metal known for its high strength-to-weight ratio, low density (4....

Categories:Sputtering Target

Country/Region:china

... decorative fields. The product is made from high-purity yttrium metal through advanced melting, forging, and precision machining processes. It features excellent sputtering stability, film layer uniformity, and structural density, making it suitable for

Categories:Sputtering Target

Country/Region:china

... ytterbium metal through precision processing, featuring excellent film uniformity, high conductivity, and good sputtering stability. It can replace traditional magnesium and silver cathode materials to improve display device performance and lifespan.

Categories:Sputtering Target

Country/Region:china

...high-purity aluminum and neodymium through precision alloying processes, featuring uniform alloy composition and stable sputtering performance. The formed film effectively suppresses "hillock" growth in the electrode layer, improving electrode flatness and